ISO TC 201 , استانداردهای آنالیز شیمیایی سطوح

دانلود استانداردهای BS EN ISO

ISO TC 201 (surface chemical analysis)

دانلود پکیج استانداردهای بین المللی ISO برای روشهای تست و آنالیز شیمیایی سطوح
(مجموعه استانداردهای کمیته فنی ISO TC 201)

لیست استانداردها و ویرایشهای موجود در 10 کمیته فرعی این پکیج:

ISO TC-201-00 DIRECT

  1. ISO 14706:2014 Surface chemical analysis — Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
  2. ISO 16413:2020 Evaluation of thickness, density and interface width of thin films by X-ray reflectometry — Instrumental requirements, alignment and positioning, data collection, data analysis and reporting
  3. ISO 17331:2004 Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
  4. ISO 17331:2004/Amd 1:2010 Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
  5. ISO 18337:2015 Surface chemical analysis — Surface characterization — Measurement of the lateral resolution of a confocal fluorescence microscope
  6. ISO/TS 18507:2015 Surface chemical analysis — Use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis
  7. ISO/TR 19693:2018 Surface chemical analysis — Characterization of functional glass substrates for biosensing applications
  8.   ISO 24465:2023   Surface chemical analysis — Determination of the minimum detectability of surface plasmon resonance device

ISO TC-201-01 Terminology

  1. ISO 18115-1:2023 Surface chemical analysis — Vocabulary — Part 1: General terms and terms used in spectroscopy
  2. ISO 18115-2:2013  Surface chemical analysis — Vocabulary — Part 2: Terms used in scanning-probe microscopy

ISO TC-201-02 General procedures

  1. ISO 16242:2011 Surface chemical analysis — Recording and reporting data in Auger electron spectroscopy (AES)
  2. ISO 16243:2011 Surface chemical analysis — Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
  3. ISO/TR 16268:2009 Surface chemical analysis — Proposed procedure for certifying the retained areic dose in a working reference material produced by ion implantation
  4. ISO 18116:2005 Surface chemical analysis — Guidelines for preparation and mounting of specimens for analysis
  5. ISO 18117:2009 Surface chemical analysis — Handling of specimens prior to analysis
  6. ISO 18516:2019 Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Determination of lateral resolution
  7. ISO/TR 19319:2013 Surface chemical analysis — Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods
  8. ISO 20579-4:2018 Surface chemical analysis — Guidelines to sample handling, preparation and mounting — Part 4: Reporting information related to the history, preparation, handling and mounting of nano-objects prior to surface analysis

ISO TC-201-03 :Data management and treatment

  1. ISO 14975:2000 Surface chemical analysis — Information formats
  2. ISO 14976:1998 Surface chemical analysis — Data transfer format
  3. ISO 22048:2004 Surface chemical analysis — Information format for static secondary-ion mass spectrometry
  4. ISO 28600:2011 Surface chemical analysis — Data transfer format for scanning-probe microscopy

ISO TC-201-04 :Depth profiling

  1. ISO 14606:2015   Surface chemical analysis — Sputter depth profiling — Optimization using layered systems as reference materials
  2. ISO/TR 15969:2001  Surface chemical analysis — Depth profiling — Measurement of sputtered depth
  3. ISO 16531:2020Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
  4. ISO 17109:2015Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
  5. ISO/TR 22335:2007 Surface chemical analysis — Depth profiling — Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer

ISO TC-201-06 :Secondary ion mass spectrometry 

  1. ISO 12406:2010 Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of arsenic in silicon
  2. ISO 13084:2011  Surface chemical analysis — Secondary-ion mass spectrometry — Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
  3. ISO 14237:2010 Surface chemical analysis — Secondary-ion mass spectrometry — Determination of boron atomic concentration in silicon using uniformly doped materials
  4. ISO 17560:2014 Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of boron in silicon
  5. ISO 17862:2013  Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
  6. ISO 18114:2003  Surface chemical analysis — Secondary-ion mass spectrometry — Determination of relative sensitivity factors from ion-implanted reference materials
  7. ISO 20341:2003 Surface chemical analysis — Secondary-ion mass spectrometry — Method for estimating depth resolution parameters with multiple delta-layer reference materials
  8. ISO 20411:2018Surface chemical analysis — Secondary ion mass spectrometry — Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
  9. ISO 23812:2009 Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth calibration for silicon using multiple delta-layer reference materials
  10. ISO 23830:2008 Surface chemical analysis — Secondary-ion mass spectrometry — Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry

ISO TC-201-07 : Electron spectroscopies

  1. ISO 10810:2010  Surface chemical analysis — X-ray photoelectron spectroscopy — Guidelines for analysis
  2. ISO 13424:2013 Surface chemical analysis — X-ray photoelectron spectroscopy — Reporting of results of thin-film analysis
  3. ISO/TR 14187:2020Surface chemical analysis — Characterization of nanostructured materials
  4. ISO 14701:2011  Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness
  5. ISO 15470:2017 Surface chemical analysis — X-ray photoelectron spectroscopy — Description of selected instrumental performance parameters
  6. ISO 15471:2016 Surface chemical analysis — Auger electron spectroscopy — Description of selected instrumental performance parameters
  7. ISO 15472:2010 Surface chemical analysis — X-ray photoelectron spectrometers — Calibration of energy scales
  8. ISO 16129:2018Surface chemical analysis — X-ray photoelectron spectroscopy — Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
  9. ISO 17973:2016 Surface chemical analysis — Medium-resolution Auger electron spectrometers — Calibration of energy scales for elemental analysis
  10. ISO 17974:2002 Surface chemical analysis — High-resolution Auger electron spectrometers — Calibration of energy scales for elemental and chemical-state analysis
  11. ISO 18118:2015 Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
  12. ISO/TR 18392:2005 Surface chemical analysis — X-ray photoelectron spectroscopy — Procedures for determining backgrounds
  13. ISO/TR 18394:2016 Surface chemical analysis — Auger electron spectroscopy — Derivation of chemical information
  14. ISO 18554:2016 Surface chemical analysis — Electron spectroscopies — Procedures for identifying, estimating and correcting for unintended degradation by X-rays in a material undergoing analysis by X-ray photoelectron spectroscopy
  15. ISO 19318:2004  Surface chemical analysis — X-ray photoelectron spectroscopy — Reporting of methods used for charge control and charge correction
  16. ISO 19668:2017Surface chemical analysis — X-ray photoelectron spectroscopy — Estimating and reporting detection limits for elements in homogeneous materials
  17. ISO 19830:2015 Surface chemical analysis — Electron spectroscopies — Minimum reporting requirements for peak fitting in X-ray photoelectron spectroscopy
  18. ISO 20903:2011 Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Methods used to determine peak intensities and information required when reporting results
  19. ISO 21270:2004 Surface chemical analysis — X-ray photoelectron and Auger electron spectrometers — Linearity of intensity scale
  20. ISO 24236:2005 Surface chemical analysis — Auger electron spectroscopy — Repeatability and constancy of intensity scale
  21. ISO 24237:2005 Surface chemical analysis — X-ray photoelectron spectroscopy — Repeatability and constancy of intensity scale
  22. ISO 29081:2010 Surface chemical analysis — Auger electron spectroscopy — Reporting of methods used for charge control and charge correction

ISO TC-201-08 :Glow discharge spectroscopy

  1. ISO 11505:2012 Surface chemical analysis — General procedures for quantitative compositional depth profiling by glow discharge optical emission spectrometry
  2. ISO 14707:2015 Surface chemical analysis — Glow discharge optical emission spectrometry (GD-OES) — Introduction to use
  3.  ISO/TS 15338:2020  Surface chemical analysis — Glow discharge mass spectrometry — Operating procedures
  4. ISO 16962:2017 Surface chemical analysis — Analysis of zinc- and/or aluminium-based metallic coatings by glow-discharge optical-emission spectrometry
  5. ISO/TS 25138:2010 Surface chemical analysis — Analysis of metal oxide films by glow-discharge optical-emission spectrometry

ISO TC-201-09 :Scanning probe microscopy

  1. ISO 11039:2012 Surface chemical analysis — Scanning-probe microscopy — Measurement of drift rate
  2. ISO 11775:2015 Surface chemical analysis — Scanning-probe microscopy — Determination of cantilever normal spring constants
  3. ISO 11952:2019 Surface chemical analysis — Scanning-probe microscopy — Determination of geometric quantities using SPM: Calibration of measuring systems
  4. ISO 13083:2015 Surface chemical analysis — Scanning probe microscopy — Standards on the definition and calibration of spatial resolution of electrical scanning probe microscopes (ESPMs) such as SSRM and SCM for 2D-dopant imaging and other purposes
  5. ISO 13095:2014 Surface Chemical Analysis — Atomic force microscopy — Procedure for in situ characterization of AFM probe shank profile used for nanostructure measurement
  6.  ISO 21222:2020  Surface chemical analysis — Scanning probe microscopy — Procedure for the determination of elastic moduli for compliant materials using atomic force microscope and the two-point JKR method
  7. ISO 27911:2011 Surface chemical analysis — Scanning-probe microscopy — Definition and calibration of the lateral resolution of a near-field optical microscope

ISO TC-201-10 : X-ray Reflectometry (XRR) and X-ray Fluorescence (XRF) Analysis

  1. ISO 20289:2018 Surface chemical analysis — Total reflection X-ray fluorescence analysis of water

 

 

مشخصات فایل
  • فرمت فایل ها: PDF
  • زبان نگارش: انگلیسی
  • کمیته فنی: ISO TC 201
  • کلیدواژه: استاندارد ایزو + استانداردهای شیمی
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